Thin Film Condensation on Nanostructured Surfaces

Abstract

Water vapor condensation is a ubiquitous process in nature and industry. Over the past century, methods achieving dropwise condensation using a thin (−2 while avoiding durability issues by significantly reducing nucleation on the hydrophobic surface. The work presented here develops an approach to potentially ensure durable and high‐performance condensation comparable to dropwise condensation.

Document Details

Document Type
Pub Defense Publication
Publication Date
Feb 15, 2018
Source ID
10.1002/adfm.201707000

Entities

People

  • Jessica A. Krogstad
  • Junho Oh
  • Nenad Miljkovic
  • Paul V Braun
  • Pralav P Shetty
  • Runyu Zhang

Organizations

  • Academy of American Poets
  • Division of Engineering Education & Centers
  • International Institute for Carbon-Neutral Energy Research, Kyushu University
  • Kyushu University
  • Ministry of Education, Culture, Sports, Science and Technology
  • National Science Foundation
  • Office of Naval Research
  • University of Illinois Urbana–Champaign

Tags

Readers

  • Strategic Security Studies
  • Thin Film Deposition Science.

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene