Orientation‐Controlled Selective‐Area Epitaxy of III–V Nanowires on (001) Silicon for Silicon Photonics
Abstract
Monolithic integration of III–V nanowires on silicon platforms has been regarded as a promising building block for many on‐chip optoelectronic, nanophotonic, and electronic applications. Although great advances have been made from fundamental material engineering to realizing functional devices, one of the remaining challenges for on‐chip applications is that the growth direction of nanowires on Si(001) substrates is difficult to control. Here, catalyst‐free selective‐area epitaxy of nanowires on (001)‐oriented silicon‐on‐insulator (SOI) substrates with the nanowires aligned to desired directions is proposed and demonstrated. This is enabled by exposing {111} planes on (001) substrates using wet chemical etching, followed by growing nanowires on the exposed planes. The formation of nanowire array‐based bottom‐up photonic crystal cavities on SOI(001) and their coupling to silicon waveguides and grating couplers, which support the feasibility for on‐chip photonic applications are demonstrated. The proposed method of integrating position‐ and orientation‐controllable nanowires on Si(001) provides a new degree of freedom in combining functional and ultracompact III–V devices with mature silicon platforms.
Document Details
- Document Type
- Pub Defense Publication
- Publication Date
- Jun 02, 2020
- Source ID
- 10.1002/adfm.202002220
Entities
People
- Brian C. Regan
- Brian Zutter
- Diana L. Huffaker
- Hyunseok Kim
- Ting‐yuan Chang
- Wook‐jae Lee
Organizations
- Air Force Office of Scientific Research
- Cardiff University
- Electronics and Telecommunications Research Institute
- National Science Foundation
- University of California
- University of California, Los Angeles