Gate‐Tunable Graphene–WSe2 Heterojunctions at the Schottky–Mott Limit

Abstract

Metal–semiconductor interfaces, known as Schottky junctions, have long been hindered by defects and impurities. Such imperfections dominate the electrical characteristics of the junction by pinning the metal Fermi energy. Here, a graphene–WSe2 p‐type Schottky junction, which exhibits a lack of Fermi level pinning, is studied. The Schottky junction displays near‐ideal diode characteristics with large gate tunability and small leakage currents. Using a gate electrostatically coupled to the WSe2 channel to tune the Schottky barrier height, the Schottky–Mott limit is probed in a single device. As a special manifestation of the tunable Schottky barrier, a diode with a dynamically controlled ideality factor is demonstrated.

Document Details

Document Type
Pub Defense Publication
Publication Date
Apr 22, 2019
Source ID
10.1002/adma.201901392

Entities

People

  • Ji Ung Lee
  • Kenji Watanabe
  • Prathamesh Dhakras
  • Samuel W LaGasse
  • Takashi Taniguchi

Organizations

  • National Institute for Materials Science
  • National Science Foundation
  • State University of New York
  • United States Naval Research Laboratory

Tags

Fields of Study

  • Physics

Readers

  • Materials Science and Engineering.
  • Quantum Dot Semiconductor Device Photonics and Graphene Optoelectronic Materials and THz Physics.
  • Thin Film Deposition Science.

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene