Microplasmas for Advanced Materials and Devices
Abstract
Microplasmas are low‐temperature plasmas that feature microscale dimensions and a unique high‐energy‐density and a nonequilibrium reactive environment, which makes them promising for the fabrication of advanced nanomaterials and devices for diverse applications. Here, recent microplasma applications are examined, spanning from high‐throughput, printing‐technology‐compatible synthesis of nanocrystalline particles of common materials types, to water purification and optoelectronic devices. Microplasmas combined with gaseous and/or liquid media at low temperatures and atmospheric pressure open new ways to form advanced functional materials and devices. Specific examples include gas‐phase, substrate‐free, plasma‐liquid, and surface‐supported synthesis of metallic, semiconducting, metal oxide, and carbon‐based nanomaterials. Representative applications of microplasmas of particular importance to materials science and technology include light sources for multipurpose, efficient VUV/UV light sources for photochemical materials processing and spectroscopic materials analysis, surface disinfection, water purification, active electromagnetic devices based on artificial microplasma optical materials, and other devices and systems including the plasma transistor. The current limitations and future opportunities for microplasma applications in materials related fields are highlighted.
Document Details
- Document Type
- Pub Defense Publication
- Publication Date
- Dec 18, 2019
- Source ID
- 10.1002/adma.201905508
Entities
People
- Davide Mariotti
- J. G. Eden
- Kostya Ostrikov
- R. Mohan Sankaran
- Wei‐hung Chiang
Organizations
- Air Force Office of Scientific Research
- Case Western Reserve University
- Engineering and Physical Sciences Research Council
- National Science and Technology Council
- Queensland University of Technology
- Ulster University
- United States Department of Energy
- University of Illinois Urbana–Champaign