Low‐Conductance and Multilevel CMOS‐Integrated Nanoscale Oxide Memristors

Abstract

Using memristors, such as oxide and phase change resistive switches, as tunable resistors to construct analog computing hardware accelerators is gaining keen attention. Such accelerators have demonstrated the potential to significantly outperform digital computers in highly relevant applications such as machine learning and image processing. However, improvements in device‐level performance of memristors, including reducing power consumption and high current–induced metal migration in interconnects, need continued developments. Nanoscaling and complementary metal‐oxide semiconductor (CMOS) integration are also of significant importance in commercialization of such accelerators. Here tantalum oxide memristors scaled down to 25 nm sizes and integrated on CMOS transistor circuits are presented. The memristor conductance is programmable with a 6 order‐of‐magnitude operating range, especially with 3‐bits below 10 µS for low current operation. The stability of such levels and the size scaling of the operating parameters are further studied. These results will aid device engineering of memristors and bolster development of neuromorphic hardware accelerators.

Document Details

Document Type
Pub Defense Publication
Publication Date
May 02, 2019
Source ID
10.1002/aelm.201800876

Entities

People

  • Brent Buchanan
  • Can Li
  • Catherine E. Graves
  • John Paul Strachan
  • Le Zheng
  • Sity Lam
  • Suhas Kumar
  • Xia Sheng
  • Xuema Li

Organizations

  • Hp
  • Intelligence Advanced Research Projects Activity

Tags

Fields of Study

  • Physics

Readers

  • Integrated Circuit Design and Technology.

Technology Areas

  • AI & ML
  • AI & ML - DoD AI Strategy
  • Microelectronics
  • Microelectronics - Graphene