Hierarchical Pore Development by Plasma Etching of Zr‐Based Metal–Organic Frameworks
Abstract
The typically stable Zr‐based metal–organic frameworks (MOFs) UiO‐66 and UiO‐66‐NH2 were treated with tetrafluoromethane (CF4) and hexafluoroethane (C2F6) plasmas. Through interactions between fluoride radicals from the perfluoroalkane plasma and the zirconium–oxygen bonds of the MOF, the resulting materials showed the development of mesoporosity, creating a hierarchical pore structure. It is anticipated that this strategy can be used as a post‐synthetic technique for developing hierarchical networks in a variety of MOFs.
Document Details
- Document Type
- Pub Defense Publication
- Publication Date
- Oct 23, 2015
- Source ID
- 10.1002/chem.201503632
Entities
People
- Gregory W. Peterson
- Jared B DeCoste
- Joseph A. Rossin
Organizations
- Defense Threat Reduction Agency