SiC Homoepitaxy, Etching and Graphene Epitaxial Growth on SiC Substrates Using a Novel Fluorinated Si Precursor Gas (SiF4)

Document Details

Document Type
Pub Defense Publication
Publication Date
Nov 25, 2015
Source ID
10.1007/s11664-015-4234-2

Entities

People

  • Kevin M. Daniels
  • M. V. S. Chandrashekhar
  • Tangali Sudarshan
  • Tawhid Rana

Organizations

  • Office of Naval Research

Tags

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene