Ion energy dependence of dry etch damage depth in Ga2O3 Schottky rectifiers

Document Details

Document Type
Pub Defense Publication
Publication Date
Sep 01, 2023
Source ID
10.1016/j.apsusc.2023.157489

Entities

People

  • Chao-Ching Chiang
  • Fan Ren
  • Jian-Sian Li
  • Stephen Pearton
  • Xinyi Xia

Organizations

  • Defense Threat Reduction Agency
  • National Science Foundation
  • National Sleep Foundation
  • United States Department of Defense