Structure of 3 at.% and 9 at.% Si-doped HfO2 from combined refinement of X-ray and neutron diffraction patterns

Document Details

Document Type
Pub Defense Publication
Publication Date
Oct 01, 2015
Source ID
10.1016/j.jallcom.2015.06.084

Entities

People

  • Chris M Fancher
  • Dong Hou
  • Jacob L. Jones
  • Jennifer S. Forrester
  • Lili Zhao
  • Saeed Moghaddam
  • Tedi-marie Usher
  • Thanakorn Iamsasri
  • Toshikazu Nishida

Organizations

  • Office of Basic Energy Sciences
  • United States Army