Effect of Ti doping and annealing on multi-level forming-free resistive random access memories with atomic layer deposited HfTiOx nanolaminate

Document Details

Document Type
Pub Defense Publication
Publication Date
Sep 01, 2013
Source ID
10.1016/j.mee.2013.03.092

Entities

People

  • Bhaswar Chakrabarti
  • E.m. Vogel

Organizations

  • Defense Advanced Research Projects Agency