Ionizing radiation tolerance of stacked Si3N4-SiO2 gate insulators for power MOSFETs

Document Details

Document Type
Pub Defense Publication
Publication Date
Jan 01, 2020
Source ID
10.1016/j.microrel.2019.113554

Entities

People

  • A. Privat
  • Arshey Patadia
  • H.j. Barnaby
  • K. Holbert
  • K. Muthuseenu

Organizations

  • National Science Foundation

Tags

Technology Areas

  • Microelectronics