Formation of high aspect ratio fused silica nanowalls by fluorine-based deep reactive ion etching

Document Details

Document Type
Pub Defense Publication
Publication Date
Jul 01, 2018
Source ID
10.1016/j.nanoso.2017.10.004

Entities

People

  • Aaron Berndt
  • Daniel Sunghoi Choi
  • Ji Sung Lee
  • Jong Eun Ryu
  • Jung-rae Park
  • Young Keun Kim

Organizations

  • Air Force Office of Scientific Research
  • BP Exploration (Alaska)
  • Indiana University – Purdue University Indianapolis
  • Masdar Institute of Science and Technology