Recent developments in photoresists for extreme-ultraviolet lithography

Document Details

Document Type
Pub Defense Publication
Publication Date
Jul 01, 2023
Source ID
10.1016/j.polymer.2023.126020

Entities

People

  • Chenyun Yuan
  • Christopher Ober
  • Florian Käfer

Organizations

  • Air Force Office of Scientific Research
  • Intel Corporation
  • Office of Basic Energy Sciences
  • Office of Science
  • United States Department of Energy