Self-Catalyzed, Low-Temperature Atomic Layer Deposition of Ruthenium Metal Using Zero-Valent Ru(DMBD)(CO)3 and Water

Document Details

Document Type
Pub Defense Publication
Publication Date
Jan 29, 2019
Source ID
10.1021/acs.chemmater.8b04456

Entities

People

  • Asim Khaniya
  • Charles L. Dezelah
  • Duy Le
  • Jacob Woodruff
  • Parag Banerjee
  • Ravindra K. Kanjolia
  • Talat S Rahman
  • William E. Kaden
  • Zhengning Gao

Organizations

  • United States Army
  • United States Department of Energy