SF4 as the Fluorination Reactant for Al2O3 and VO2 Thermal Atomic Layer Etching
Document Details
- Document Type
- Pub Defense Publication
- Publication Date
- Apr 12, 2019
- Source ID
- 10.1021/acs.chemmater.8b05294
Entities
People
- Austin M. Cano
- Jonas C Gertsch
- Steven M. George
- Victor M. Bright
Organizations
- Army Research Office
- Division of Chemistry
- United States Army Research Laboratory