Toward Atomic-Scale Patterned Atomic Layer Deposition: Reactions of Al2O3 Precursors on a Si(001) Surface with Mixed Functionalizations

Document Details

Document Type
Pub Defense Publication
Publication Date
Feb 01, 2016
Source ID
10.1021/acs.jpcc.5b09053

Entities

People

  • D. Dick
  • J. B. Ballard
  • J. H. G. Owen
  • J. N. Randall
  • K. Cho
  • R. C. Longo
  • R. M. Wallace
  • S. Mcdonnell
  • Y. J. Chabal

Organizations

  • Defense Advanced Research Projects Agency
  • Division of Chemistry
  • Texas Emerging Technology Fund
  • University of Texas at Dallas