Electron-Enhanced Atomic Layer Deposition of Boron Nitride Thin Films at Room Temperature and 100 °C
Document Details
- Document Type
- Pub Defense Publication
- Publication Date
- Mar 29, 2018
- Source ID
- 10.1021/acs.jpcc.8b00796
Entities
People
- Alexana Roshko
- Andrew S. Cavanagh
- Huaxing Sun
- Jaclyn K. Sprenger
- Paul T. Blanchard
- Steven M. George
Organizations
- Defense Advanced Research Projects Agency
- National Institute of Standards and Technology