Resist-Free Lithography for Monolayer Transition Metal Dichalcogenides

Document Details

Document Type
Pub Defense Publication
Publication Date
Jan 10, 2022
Source ID
10.1021/acs.nanolett.1c04081

Entities

People

  • Andrew J. Mannix
  • Ce Liang
  • Fauzia Mujid
  • J-H Kang
  • Jaehyung Yu
  • Jiwoong Park
  • Myungjae Lee
  • Preeti Poddar
  • Saien Xie
  • Yu Zhong

Organizations

  • Air Force Office of Scientific Research
  • Division of Graduate Education
  • Division of Materials Research
  • Samsung Advanced Institute of Technology
  • The Camille and Henry Dreyfus Foundation
  • United States Department of Energy
  • University of Chicago