In Situ Hydrogen Plasma Exposure for Varying the Stoichiometry of Atomic Layer Deposited Niobium Oxide Films for Use in Neuromorphic Computing Applications
Document Details
- Document Type
- Pub Defense Publication
- Publication Date
- Mar 30, 2020
- Source ID
- 10.1021/acsami.0c01279
Entities
People
- Alexander C. Kozen
- Evan R. Glaser
- Hans Cho
- Laura B Ruppalt
- M. E. Twigg
- Sharka M. Prokes
- Thomas J. Larrabee
- Zachary R. Robinson
Organizations
- American Society for Engineering Education
- Jacobs Engineering Group
- Office of Naval Research
- State University of New York at Brockport
- United States Naval Research Laboratory