Remote Plasma Oxidation and Atomic Layer Etching of MoS2

Document Details

Document Type
Pub Defense Publication
Publication Date
Jul 14, 2016
Source ID
10.1021/acsami.6b04719

Entities

People

  • Angelica Azcatl
  • Hui Zhu
  • Jiyoung Kim
  • Lanxia Cheng
  • Robert M Wallace
  • Xiaoye Qin

Organizations

  • National Institute of Standards and Technology
  • National Science Foundation
  • Semiconductor Research Corporation
  • United States Department of Defense
  • University of Texas at Dallas