Photolithography-Based Nanopatterning Using Re-entrant Photoresist Profile

Document Details

Document Type
Pub Defense Publication
Publication Date
Jan 18, 2018
Source ID
10.1021/acsami.7b17628

Entities

People

  • Huilong Zhang
  • Juhwan Lee
  • Kwangeun Kim
  • Tong June Kim
  • Yei Hwan Jung
  • Zhenqiang Ma

Organizations

  • Air Force Office of Scientific Research
  • University of Wisconsin–Madison