Orthogonally Aligned Block Copolymer Line Patterns on Minimal Topographic Patterns

Document Details

Document Type
Pub Defense Publication
Publication Date
Feb 14, 2018
Source ID
10.1021/acsami.7b17713

Entities

People

  • Duk Man Yu
  • Feng Liu
  • Hyeyoung Kim
  • Jaewon Choi
  • June Huh
  • Kenneth R Carter
  • Paul Y Kim
  • Thomas Paul Russell
  • Yinyong Li

Organizations

  • Air Force Office of Scientific Research
  • Beijing University of Chemical Technology
  • Center for Hierarchical Manufacturing
  • Korea University
  • Lawrence Berkeley National Laboratory
  • Samsung Group
  • University of Massachusetts

Tags

Technology Areas

  • Microelectronics