Effect of Al2O3 Seed-Layer on the Dielectric and Electrical Properties of Ultrathin MgO Films Fabricated Using In Situ Atomic Layer Deposition
Document Details
- Document Type
- Pub Defense Publication
- Publication Date
- Jul 29, 2019
- Source ID
- 10.1021/acsami.9b05601
Entities
People
- Devon Romine
- Jagaran Acharya
- Judy Z. Wu
- Ridwan Sakidja
- Ryan Goul
Organizations
- Army Research Office
- Division of Electrical, Communications & Cyber Systems
- Division of Materials Research
- Missouri State University
- University of Kansas