Refractive Index Tuning of All-Inorganic TiO2 Nanocrystal-Based Films and High Aspect Ratio Nanostructures Using Atomic Layer Deposition: Implications for High-Throughput Fabrication of Metalenses

Document Details

Document Type
Pub Defense Publication
Publication Date
Jan 25, 2023
Source ID
10.1021/acsanm.2c04982

Entities

People

  • Amir Arbabi
  • Andrew McClung
  • Dae Eon Jung
  • Feyza Dündar Arısoy
  • Irene R. Howell
  • James J Watkins
  • Lucas D. Verrastro
  • Vincent Einck

Organizations

  • Center for Hierarchical Manufacturing
  • Division of Industrial Innovation & Partnerships
  • United States Army Research Laboratory
  • University of Massachusetts

Tags

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene