Plasma-Enhanced Atomic Layer Deposition of HfO2 on Monolayer, Bilayer, and Trilayer MoS2 for the Integration of High-κ Dielectrics in Two-Dimensional Devices

Document Details

Document Type
Pub Defense Publication
Publication Date
Jul 16, 2019
Source ID
10.1021/acsanm.9b00505

Entities

People

  • Aaron D. Franklin
  • Chinedu Ekuma
  • Katherine Price
  • Madan Dubey
  • Robert A. Burke
  • Sina Najmaei

Organizations

  • Duke University
  • Lehigh University
  • United States Army Research Laboratory