Nanometer-Thick Oxide Semiconductor Transistor with Ultra-High Drain Current
Document Details
- Document Type
- Pub Defense Publication
- Publication Date
- Nov 29, 2022
- Source ID
- 10.1021/acsnano.2c10383
Entities
People
- Adam Charnas
- Chang Niu
- Haiyan Wang
- Jesse Maassen
- Kyeongjae Cho
- Mark S. Lundstrom
- Mengwei Si
- Pai-Ying Liao
- Peide Ye
- Vahid Askarpour
- Yaoqiao Hu
- Yizhi Zhang
- Zehao Lin
- Zhongxia Shang
- Zhuocheng Zhang
Organizations
- Air Force Office of Scientific Research
- Compute Canada
- Dalhousie University
- Defense Advanced Research Projects Agency
- Natural Sciences and Engineering Research Council
- Purdue University
- Semiconductor Research Corporation
- University of Texas at Dallas