High Capacitance, Photo-Patternable Ion Gel Gate Insulators Compatible with Vapor Deposition of Metal Gate Electrodes

Document Details

Document Type
Pub Defense Publication
Publication Date
Oct 16, 2014
Source ID
10.1021/am505298q

Entities

People

  • C. Daniel Frisbie
  • Jae-hong Choi
  • Kihyon Hong
  • Timothy P. Lodge
  • Wei Xie
  • Yuanyan Gu

Organizations

  • Air Force Office of Scientific Research
  • University of Minnesota

Tags

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene