Synergistic Boron Doping of Semiconductor and Dielectric Layers for High-Performance Metal Oxide Transistors: Interplay of Experiment and Theory

Document Details

Document Type
Pub Defense Publication
Publication Date
Sep 05, 2018
Source ID
10.1021/jacs.8b06395

Entities

People

  • Antonio Facchetti
  • Binghao Wang
  • Gang Wang
  • Julia E. Medvedeva
  • Li Zeng
  • Michael Bedzyk
  • Tobin J. Marks
  • Wei Huang
  • Weifeng Zhang
  • Weigang Zhu
  • Xinan Zhang
  • Yao Chen

Organizations

  • China Scholarship Council
  • Division of Materials Research
  • Henan University
  • Missouri University of Science and Technology
  • National Natural Science Foundation of China
  • Northwestern University
  • Office of Naval Research

Tags

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene