Colloidal Atomic Layer Deposition with Stationary Reactant Phases Enables Precise Synthesis of “Digital” II–VI Nano-heterostructures with Exquisite Control of Confinement and Strain

Document Details

Document Type
Pub Defense Publication
Publication Date
Aug 03, 2019
Source ID
10.1021/jacs.9b04866

Entities

People

  • Abhijit Hazarika
  • Benjamin T Diroll
  • Dmitri V. Talapin
  • Eran Rabani
  • Igor Coropceanu
  • Igor Fedin
  • Jinglong Guo
  • John P Philbin
  • Joshua Portner
  • Liang Hong
  • Robert Klie
  • Vishwas Srivastava
  • Wooje Cho

Organizations

  • Air Force Office of Scientific Research
  • Argonne National Laboratory
  • Division of Chemistry
  • Division of Materials Research
  • Lawrence Berkeley National Laboratory
  • Office of Basic Energy Sciences
  • Office of Science
  • Samsung Group
  • Tel Aviv University
  • University of Chicago
  • University of Illinois at Chicago
  • Yusuf Hamied Department of Chemistry