Tailoring the Growth Rate and Surface Facet for Synthesis of High-Quality Continuous Graphene Films from CH4 at 750 °C via Chemical Vapor Deposition
Document Details
- Document Type
- Pub Defense Publication
- Publication Date
- May 15, 2015
- Source ID
- 10.1021/jp5116355
Entities
People
- Feng Xu
- Meng-yin Wu
- Michael S Arnold
- Patrick Desjardins
- Pierre L. Levesque
- Richard Martel
- Robert M Jacobberger
- Saman Choubak
Organizations
- Polytechnic School of Montreal
- United States Department of Defense
- University of Wisconsin–Madison
- Université de Montréal