Influence of Stoichiometry on the Optical and Electrical Properties of Chemical Vapor Deposition Derived MoS2

Document Details

Document Type
Pub Defense Publication
Publication Date
Sep 22, 2014
Source ID
10.1021/nn503988x

Entities

People

  • Arturo Ponce
  • Deep Jariwala
  • Fengyuan Shi
  • Francisco Ruiz-zepeda
  • In Soo Kim
  • Joshua D. Wood
  • Kan-sheng Chen
  • Lincoln J Lauhon
  • Mark Hersam
  • Miguel José-yacaman
  • Spencer Park
  • Tobin J. Marks
  • Vinayak P. Dravid
  • Vinod K Sangwan

Organizations

  • Division of Materials Research
  • National Institute of Standards and Technology
  • Northwestern University
  • Office of Naval Research
  • University of Texas at San Antonio
  • W. M. Keck Foundation