Polymer brush hypersurface photolithography
Abstract
Polymer brush patterns have a central role in established and emerging research disciplines, from microarrays and smart surfaces to tissue engineering. The properties of these patterned surfaces are dependent on monomer composition, polymer height, and brush distribution across the surface. No current lithographic method, however, is capable of adjusting each of these variables independently and with micrometer-scale resolution. Here we report a technique termed Polymer Brush Hypersurface Photolithography, which produces polymeric pixels by combining a digital micromirror device (DMD), an air-free reaction chamber, and microfluidics to independently control monomer composition and polymer height of each pixel. The printer capabilities are demonstrated by preparing patterns from combinatorial polymer and block copolymer brushes. Images from polymeric pixels are created using the light reflected from a DMD to photochemically initiate atom-transfer radical polymerization from initiators immobilized on Si/SiO2 wafers. Patterning is combined with high-throughput analysis of grafted-from polymerization kinetics, accelerating reaction discovery, and optimization of polymer coatings.
Document Details
- Document Type
- Pub Defense Publication
- Publication Date
- Mar 06, 2020
- Source ID
- 10.1038/s41467-020-14990-x
Entities
People
- Adam B Braunschweig
- Alexa M Wong
- Andrea S. Carlini
- Carlos Carbonell
- Daniel Valles
- Joanna Korpanty
- Mollie A. Touve
- Nathan C. Gianneschi
Organizations
- Air Force Office of Scientific Research
- National Science Foundation
- United States Department of Defense