Ultrathin ferroic HfO2–ZrO2 superlattice gate stack for advanced transistors

Document Details

Document Type
Pub Defense Publication
Publication Date
Apr 06, 2022
Source ID
10.1038/s41586-022-04425-6

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  • Apurva Mehta
  • Brian Tyrrell
  • Cheng-Hsiang Hsu
  • Chenming Hu
  • Christopher J. Tassone
  • Chung-hsun Lin
  • Corey Stull
  • Costas P Grigoropoulos
  • Daewoong Kwon
  • David Thompson
  • Dominick Pipitone
  • Dong Ik Suh
  • Dong Jin Jung
  • Ghazal Saheli
  • Gianni Pinelli
  • Jim Ciston
  • Jinseong Heo
  • John W Freeland
  • Jong-Ho Bae
  • Jorge Gomez
  • Kab-jin Nam
  • Li-Chen Wang
  • Matthew San Jose
  • Matthew T Cook
  • Mohamed Mohamed
  • Narendra Parihar
  • Nirmaan Shanker
  • Padraic Shafer
  • Patrick Fay
  • Ramamoorthy Ramesh
  • Ravi Rastogi
  • Sayeef Salahuddin
  • Seunggeol Nam
  • Shang-Lin Hsu
  • Souvik Mahapatra
  • Steve K. Volkman
  • Suman Datta
  • Suraj S. Cheema
  • Vladimir A. Stoica
  • Wenshen Li
  • Won-tae Koo
  • Woo-bin Song
  • Wriddhi Chakraborty
  • Yoonsoo Rho
  • Yu-Hung Liao
  • Zhan Zhang