Structural and Photoelectric Properties of Epitaxially Grown Vanadium Dioxide Thin Films on c-Plane Sapphire and Titanium Dioxide

Abstract

Vanadium dioxide (VO2) is one of the most extensively studied materials in the strongly correlated electron family capable of sustaining an insulator-to-metal transition. Here we present our studies of high-quality thin films of epitaxially grown VO2 on c-Al2O3(0001) and TiO2(001) via reactive DC pulsed magnetron sputtering. We present the structural transition probed via Reflection High Energy Electron Diffraction (RHEED) for the first time and we correlate the surface microstructure measurements with simulations before, during, and after the thermally induced transition. We also study the photoelectric conversion of VO2 on TiO2(001) and c-Al2O3(0001) under 405 nm light and demonstrate up to a 2000% increase in quantum efficiency as the power of the light is varied for VO2 on TiO2(001).

Document Details

Document Type
Pub Defense Publication
Publication Date
Jun 27, 2019
Source ID
10.1038/s41598-019-45806-8

Entities

People

  • Douglas B. Beringer
  • Irina Novikova
  • Jason A Creeden
  • Melissa Beebe
  • R. Ale Lukaszew
  • Scott E. Madaras

Organizations

  • Defense Threat Reduction Agency

Tags

Fields of Study

  • Physics

Readers

  • Nanofabrication and Microfabrication.
  • Thin Film Deposition Science.

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene
  • Quantum Computing