P-type doping of elemental bismuth with indium, gallium and tin: a novel doping mechanism in solids

Abstract

A new mechanism is identified for doping semiconductors, based on modifications accomplished by impurity atoms deep in the valence band.

Document Details

Document Type
Pub Defense Publication
Publication Date
Jan 01, 2015
Source ID
10.1039/c5ee01309g

Entities

People

  • Bartlomiej Wiendlocha
  • Hyungyu Jin
  • Joseph P. Heremans

Organizations

  • Air Force Office of Scientific Research
  • National Science Centre Poland
  • Ohio State University
  • United States Army

Tags

Readers

  • Materials Science and Engineering.

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene