Patterning microfluidic device wettability with spatially-controlled plasma oxidation

Abstract

Spatially-controlled plasma treatment enables easy, accurate, reliable and scalable wettability patterning of microfluidic devices.

Document Details

• Document Type: Pub Defense Publication
• Publication Date: Jan 01, 2015
• Source ID: 10.1039/c5lc00626k

Entities

People

• Adam R. Abate
• David J. Sukovich
• Samuel C. Kim

Organizations

• Defense Advanced Research Projects Agency
• National Institutes of Health
• National Science Foundation
• United States Army
• University of California, San Francisco