Plasma-induced highly efficient synthesis of boron doped reduced graphene oxide for supercapacitors
Abstract
In this work, we presented a novel route to synthesize boron doped reduced graphene oxide (rGO) by using the dielectric barrier discharge (DBD) plasma technology under ambient conditions.
Document Details
- Document Type
- Pub Defense Publication
- Publication Date
- Jan 01, 2016
- Source ID
- 10.1039/c6cc04052g
Entities
People
- Hanmei Jiang
- Jingzheng Ren
- Lichun Dong
- Limei Zhang
- Luyi Sun
- Mingtao Zheng
- Shaobo Li
- Zhaofeng Wang
Organizations
- Air Force Office of Scientific Research
- Chongqing University
- Institute of Materials Science
- National Natural Science Foundation of China
- National Science Foundation
- United States Army
- University of Connecticut
- University of Minnesota College of Science and Engineering
- University of Southern Denmark