Optimization of 4D polymer printing within a massively parallel flow-through photochemical microreactor
Abstract
Brush polymer patterns, where the position (x,y), height (z), and chemical composition of each feature in an array were controlled independently, were prepared by combining massively parallel tip-based photolithography, microfluidics, and photochemical radical polymerizations.
Document Details
- Document Type
- Pub Defense Publication
- Publication Date
- Jan 01, 2016
- Source ID
- 10.1039/c6py00283h
Entities
People
- Adam B Braunschweig
- Ezan A. Kothari
- Samuel R Peurifoy
- Xiaoming Liu
- Yeting Zheng
Organizations
- Army Research Office
- National Science Foundation Directorate for Biological Sciences
- United States Army
- United States Department of Defense
- University of Miami
- Yusuf Hamied Department of Chemistry