Chemical vapour deposition of metalloporphyrins: a simple route towards the preparation of gas separation membranes
Abstract
The simultaneous polymerisation and chemical vapour deposition (CVD) of metalloporphyrins yield a new class of defect-free and nanoporous layers with outstanding gas separation properties.
Document Details
- Document Type
- Pub Defense Publication
- Publication Date
- Jan 01, 2016
- Source ID
- 10.1039/c6ta08003k
Entities
People
- Karen K. Gleason
- Minghui Wang
- Nicolas D. Boscher
Organizations
- Army Research Office
- Massachusetts Institute of Technology
- National Research Fund Luxembourg
- United States Army
- University of Cambridge