Atmospheric pressure chemical vapor deposition of methylammonium bismuth iodide thin films
Abstract
High quality methylammonium bismuth iodide films made using atmospheric pressure chemical vapor deposition.
Document Details
- Document Type
- Pub Defense Publication
- Publication Date
- Jan 01, 2017
- Source ID
- 10.1039/c7ta06578g
Entities
People
- Arashdeep S. Thind
- Bo Yin
- Bryce Sadtler
- Meikun Shen
- Parag Banerjee
- Peifu Cheng
- Rohan Mishra
- Sung Beom Cho
- Xiao Chen
- Yoon Myung
- Zhengning Gao
Organizations
- Army Research Office
- Department of Science and Technology
- Division of Chemical, Bioengineering, Environmental, and Transport Systems
- Institute of Materials Science
- Oak Ridge Associated Universities
- United States Army
- United States Department of Energy
- Washington University in St. Louis
- Yusuf Hamied Department of Chemistry