Reaction mechanisms and sensitivity of silicon nitrocarbamate and related systems from quantum mechanics reaction dynamics
Abstract
The intramolecular differences of four compounds lead to significant distinctions in the reaction mechanisms and sensitivity under heating.
Document Details
- Document Type
- Pub Defense Publication
- Publication Date
- Jan 01, 2018
- Source ID
- 10.1039/c7ta10998a
Entities
People
- Fenglei Huang
- Sergey V. Zybin
- Tao Cheng
- Tingting Zhou
- William Andrew Goddard III
Organizations
- Beijing Institute of Technology
- California Institute of Technology
- Institute of Applied Physics and Computational Mathematics
- National Natural Science Foundation of China
- Office of Naval Research
- United States Army