Effect of annealing conditions on the electrical properties of ALD-grown polycrystalline BiFeO3 films
Abstract
We show that a proper selection of annealing conditions is crucial for optimizing the properties of ALD-grown BiFeO3 thin films.
Document Details
- Document Type
- Pub Defense Publication
- Publication Date
- Jan 01, 2018
- Source ID
- 10.1039/c7tc05755e
Entities
People
- Aleksandr V. Plokhikh
- Craig J. Johnson
- Jonathan E Spanier
- Matthias Falmbigl
- Thomas C. Parker
- И. С. Головина
Organizations
- Division of Chemical, Bioengineering, Environmental, and Transport Systems
- Division of Materials Research
- Drexel University
- Institute of Semiconductor Physics
- Office of Naval Research
- United States Army
- United States Army Research Laboratory