Lift-off cell lithography for cell patterning with clean background
Abstract
A novel and simple technique called lift-off cell lithography was developed for high-efficiency cell patterning with nearly zero background defects.
Document Details
- Document Type
- Pub Defense Publication
- Publication Date
- Jan 01, 2018
- Source ID
- 10.1039/c8lc00726h
Entities
People
- Cong Wu
- Michael A Teitell
- Pei-shan Chung
- Pei-yu Chiou
- Tianxing Man
- Xiongfeng Zhu
Organizations
- Air Force Office of Scientific Research
- City University of Hong Kong
- National Institute of General Medical Sciences
- National Science Foundation
- United States Army
- University of California