Etching of transition metal dichalcogenide monolayers into nanoribbon arrays
Abstract
A facile mechano-chemical method was developed to etch TMDC monolayers into anisotropic nanoribbon arrays through wet chemistry. The etching is done under both the effect of chemical reaction with ascorbic acid, and mechanical detachment from the substrate using water's dipole moment.
Document Details
- Document Type
- Pub Defense Publication
- Publication Date
- Jan 01, 2019
- Source ID
- 10.1039/c8nh00364e
Entities
People
- Amey Apte
- Chandra S. Tiwary
- Jordan A Hachtel
- Juan Carlos Idrobo
- Pulickel Ajayan
- Ramazan Öztürk
- Robert Vajtai
- Xiang Zhang
Organizations
- Air Force Office of Scientific Research
- Army Research Office
- Center for Nanophase Materials Sciences
- Oak Ridge National Laboratory
- Rice University
- United States Army
- University of Szeged
- Yusuf Hamied Department of Chemistry