Silicon compatible Sn-based resistive switching memory

Abstract

Comprehensive criterion for electrode metal selection applicable to cationic filamentary devices enables a CMOS compatible Sn-based resistive switching memory.

Document Details

Document Type
Pub Defense Publication
Publication Date
Jan 01, 2018
Source ID
10.1039/c8nr01540f

Entities

People

  • Bhaswar Chakrabarti
  • Daniel Rosenmann
  • Jianqiang Lin
  • Kai Ni
  • Kiran Sasikumar
  • Leonidas E. Ocola
  • Liliana Stan
  • Pabitra Choudhury
  • Ralu Divan
  • Subramanian K R S Sankaranarayanan
  • Suman Datta
  • Supratik Guha
  • Sushant Sonde
  • Yuzi Liu

Organizations

  • Argonne National Laboratory
  • Center for Nanoscale Materials
  • Defense Advanced Research Projects Agency
  • National Science Foundation
  • New Mexico Institute of Mining and Technology
  • Pritzker School of Molecular Engineering
  • United States Army
  • United States Department of Energy
  • University of Notre Dame

Tags

Fields of Study

  • Materials science

Readers

  • Electrical Engineering
  • Integrated Circuit Design and Technology.
  • Quantum Dot Semiconductor Device Photonics and Graphene Optoelectronic Materials and THz Physics.