Pulsed-light surface annealing for low contact resistance interfaces between metal electrodes and bismuth telluride thermoelectric materials
Abstract
The pulsed light annealing process improves the efficiency of bismuth telluride based thermoelectric devices by reducing the contact resistance significantly.
Document Details
- Document Type
- Pub Defense Publication
- Publication Date
- Jan 01, 2019
- Source ID
- 10.1039/c8tc03147a
Entities
People
- Dan Mitchell
- Giri Joshi
- James D. Austin
- Josh Ruedin
- Kyle Hoover
- Leslie Wood
- Mike Mcaleer
- Rey Guzman
- Steve Savoy
Organizations
- Jet Propulsion Laboratory
- United States Army
- United States Navy