Halogen bonding in UiO-66 frameworks promotes superior chemical warfare agent simulant degradation
Abstract
Herein, a series of halogenated UiO-66 derivatives was synthesized and analyzed for the breakdown of the CWA simulant dimethyl-4-nitrophenyl phosphate (DMNP) to analyze ligand effects.
Document Details
- Document Type
- Pub Defense Publication
- Publication Date
- Jan 01, 2019
- Source ID
- 10.1039/c9cc00642g
Entities
People
- Francesco Paesani
- Joseph M Palomba
- Kyle C Bentz
- Kyle S. Barcus
- Mark Kalaj
- Mohammad R Momeni
- Seth M Cohen
Organizations
- Army Research Office
- Division of Chemistry
- United States Army
- University of California
- Yusuf Hamied Department of Chemistry