Hierarchical patterns with sub-20 nm pattern fidelity via block copolymer self-assembly and soft nanotransfer printing
Abstract
We describe the development of a technique to transfer micrometer patterns of organic thin films with sub-50 nm edge resolution and sub-20 nm pattern fidelity.
Document Details
- Document Type
- Pub Defense Publication
- Publication Date
- Jan 01, 2019
- Source ID
- 10.1039/c9py00335e
Entities
People
- Arend M. van der Zande
- Cory. R. Dean
- Harrison M Bergman
- Helen Tran
- Kaia R Parenti
- Luis M Campos
Organizations
- Columbia University
- Intelligence Community Postdoctoral Research Fellowship Program
- Office of Naval Research
- United States Army
- United States Department of Defense
- Yusuf Hamied Department of Chemistry