Self-aligned sequential lateral field non-uniformities over channel depth for high throughput dielectrophoretic cell deflection
Abstract
Self-aligned sequential lateral field non-uniformities extending uniformly over the sample channel depth are fabricated using a single lithography step for enabling phenotype-specific dielectrophoretic separation of cells.
Document Details
- Document Type
- Pub Defense Publication
- Publication Date
- Jan 01, 2021
- Source ID
- 10.1039/d0lc01211d
Entities
People
- Armita Salahi
- Audrey Brown
- Carlos Honrado
- Jennifer Guler
- Karina Torres-Castro
- Nathan S. Swami
- Rasin Ahmed
- Walter Varhue
- Xuhai Huang
Organizations
- National Center for Advancing Translational Sciences
- Office of the Secretary of Defense
- United States Army
- University of Virginia