Photolithography in the vacuum ultraviolet (172 nm) with sub-400 nm resolution: photoablative patterning of nanostructures and optical components in bulk polymers and thin films on semiconductors
Abstract
Precision photoablation of bulk polymers or films with incoherent 172 nm radiation from flat, microplasma array-powered lamps provides the foundation for a photolithographic process in which an acrylic or other polymer serves as a dry photoresist.
Document Details
- Document Type
- Pub Defense Publication
- Publication Date
- Jan 01, 2020
- Source ID
- 10.1039/d0nr04142d
Entities
People
- A E Mironov
- Austin W. Steinforth
- Dane J. Sievers
- J. G. Eden
- Jinhong Kim
- Yin Huang
Organizations
- Air Force Office of Scientific Research
- University of Illinois Urbana–Champaign